5 kV multielectron beam lithography: MAPPER tool and resist process characterization

  1. Rio, D.
  2. Constancias, C.
  3. Martin, M.
  4. Icard, B.
  5. Van Nieuwstadt, J.
  6. Vijverberg, J.
  7. Pain, L.
Aldizkaria:
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

ISSN: 2166-2754 2166-2746

Argitalpen urtea: 2010

Alea: 28

Zenbakia: 6

Mota: Artikulua

DOI: 10.1116/1.3517664 GOOGLE SCHOLAR