5 kV multielectron beam lithography: MAPPER tool and resist process characterization
- Rio, D.
- Constancias, C.
- Martin, M.
- Icard, B.
- Van Nieuwstadt, J.
- Vijverberg, J.
- Pain, L.
ISSN: 2166-2754, 2166-2746
Année de publication: 2010
Volumen: 28
Número: 6
Type: Article